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Result: Applicability of projection lithography using a gradient-index lens array to patterning of 50–150 micron thick resist

Title:

Applicability of projection lithography using a gradient-index lens array to patterning of 50–150 micron thick resist

Authors:

Source:

In Precision Engineering January 2026 97:326-333

Database:

ScienceDirect

*Result*: Applicability of projection lithography using a gradient-index lens array to patterning of 50–150 micron thick resist